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化工仪器网>产品展厅>半导体行业专用仪器>热工艺设备/热处理设备>退火炉>LH-RTA-C 4寸快速退火炉

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LH-RTA-C 4寸快速退火炉

具体成交价以合同协议为准
产品标签

快速退火炉RTARTP

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量伙半导体设备(上海)有限公司成立于2018年,位于上海市浦东新区。公司专注于半导体芯片设备的研发、生产和销售,为半导体芯片制造行业提供可靠的设备和高质量的服务、

公司在安徽合肥设有研发、生产基地,在北京、西安设有办事处。

公司自主研发的快速退火炉RTP具有出色的技术水平,已在Fab厂、研究所、高校等芯片生产单位得到广泛应用。


Larcomse Equipment (Shanghai) Co., Ltd. was established in 2018 and is located in Pudong New Area, Shanghai. The company focuses on the R & D, production and sales of semiconductor chip equipment, providing high-end equipment and high-quality services for the semiconductor chip manufacturing industry


The company has R & D and production bases in Hefei, Anhui Province, and offices in Beijing and Xi'an.


The rapid annealing furnace RTP independently developed by the company has the leading technical level in China and has been widely used in fab factories, research institutes, universities and other chip production units.


快速退火炉

设备规格:


1.手动操作模式;


2. 适应于 2英寸-4英寸 晶圆或者支持 (100mmx100mm)样品;


3.退火温度范围 300℃-1000℃;


4.升温速率 ≦100℃/sec(裸片);


5.温度均匀性 ≦±1%(>500 ℃);


6.常压腔体(可选配真空腔体);


7.冷却方式包括水冷和氮气吹扫;


8.MFC控制,1-4路制程气体。

设备规格:


1.手动操作模式;


2. 适应于 2英寸-4英寸 晶圆或者支持 (100mmx100mm)样品;


3.退火温度范围 300℃-1000℃;


4.升温速率 ≦100℃/sec(裸片);


5.温度均匀性 ≦±1%(>500 ℃);


6.常压腔体(可选配真空腔体);


7.冷却方式包括水冷和氮气吹扫;


8.MFC控制,1-4路制程气体。


Larcomse Equipment (Shanghai) Co., Ltd. was established in 2018 and is located in Pudong New Area, Shanghai. The company focuses on the R & D, production and sales of semiconductor chip equipment, providing high-end equipment and high-quality services for the semiconductor chip manufacturing industry



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氧化扩散设备


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