AccuThermo AW 410 快速退火炉 或保护气氛热处理炉

Allwin21 Corp （www.allwin21.com） 是一家总部设在美国硅谷的专业半导体设备与技术服务公司。我公司可提供全新的或翻新的快速退火炉或保护气氛热处理炉 AccuThermo AW 410,AccuThermo AW 610,AccuThermo AW 810,Heatpulse  AG610 、;EG2001/2010/1034探针台;HP4062/HP4145测试仪;AW-PCM测试软件

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610.  Allwin21 is manufacturing the AccuThermo AW-610,AccuThermo AW 810,originally the AG Heatpulse 610.The AccuThermo AW-610,AccuThermo AW 810 have innovative softwaremore advanced temperature control technologies.

AccuThermo AW 410  is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber''s cold-wall design, superior heating uniformity advanced temperature control technologyAW 900 new software, provide significant advantages over conventional furnace processingconventional RTP systems. 

Rapid thermal processing （or RTP） refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures （up to 1200 C or greater） on a timescale of several seconds or less. The wafers must be brought down （temperature） slow enough however, so they do not break due to thermal shock..Such rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflowchemical vapor deposition.

Rapid thermal anneal （RTA） is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process （RTP）.

AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R&D centers, Institutes all over the world have been using AG Heatpulse Systems. 

Allwin21 Corp can provide the following refurbished RTP equipment

• AG Heatpulse 210
• AG Heatpulse 410
• AG Heatpulse 610

       Heatpulse 210                                  Heatpulse 610                          

Allwin21 Corp. can also provide  Allwin21 Corp proprietary AW Control SoftwareSuperior Temperature Control Technology  to upgrade the refurbished equipment which provides the following significant advantages

• Integrated process control system
• Real time graphics display
• Real time process data acquisition, display,analysis
• Programmed comprehensive calibrationdiagnostic functions
• Better performancemaintenance than the original systems

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610.  Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative softwaremore advanced temperature control technologies.

 New AccuThermo AW 610

New AccuThermo AW 810M

AccuThermo AW 410

AccuThermo  AW 410’s key features include:                                                                 

• Advanced ERP Pyrometer for precise high temperature measurement
• Add timer watch for the oven safety issue （the original  has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running）.
• The new software with power summary function to detect either lamp failure or sensor failure
•  Manual Operation
• Use Sumpower as a parameter to control the uniformity of the wafer.
• Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
• Precise time-temperature profiles tailored to suit specific process requirements.
• High-intensity visible radiation heats wafers for short periods. Fast heatingcooling rates unobtainable in conventional technologies.
• Consistent wafer-to-wafer process cycle repeatability.
• Elimination of external contamination.
• Small footprintenergy efficiency.
• Software calibrationeasy to be done.
• More functionsI/O hardware “exposed” for easier maintenancetrouble shooting.
• It is easy to edit recipe with GUIgraph display.
• Save all process data on the computer hard disk.
• A/DD/A precision is 14 to 16 bits.
• Detect in processwith color curve displayed on the screen.
• Lamp damage detect in process.  
• Sensor status detect function.
• On line help function

AccuThermo AW 410 RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• OxidationNitridation
• GaAs Processing
For a bibliographyreprints of technical journal articles regarding these AccuTherm  applications, contact the Allwin21 Corp. Marketing Communications Department.