CuS 硫化铜晶体返回列表页

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品牌2D Semiconductors

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所在地泰州市

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更新时间：2024-06-02 19:33:26浏览次数：937次

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二维材料: 钙钛矿/OLED 异质结 MOFS材料其他二维材料二维材料溶液二维材料薄膜二维材料粉末绝缘体黑磷六方氮化硼晶体碲化物晶体硒化物晶体硫化物晶体

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供货周期	现货	应用领域	化工,地矿,能源

CuS is a member of metal chalcogenides (see our GaSe and GaTe products). It has a layered structure (lamellar) with weak interlayer coupling. In the bulk form, it is a direct band gap semiconductor

详情介绍

CuS is a member of metal chalcogenides (see our GaSe and GaTe products). It has a layered structure (lamellar) with weak interlayer coupling. In the bulk form, it is a direct band gap semiconductor with 1.6 eV band gap. Experimentally, monolayers are yet to be discovered. The size of the sample starts at 3mmx3mm goes up to 7mmx7mm and is highly crystalline. Ideal for cleavage.

Possible applications:
Electronics
Sensors - detectors
Optics
STM – AFM applications
Solar cells
Ultra-low friction studies (tribology)
Materials science and semiconductor research