ALD-100 原子层沉积
具体成交价以合同协议为准
- 公司名称 SVT Associates
- 品牌
- 型号 ALD-100
- 产地 美国
- 厂商性质 经销商
- 更新时间 2017/9/14 5:38:32
- 访问次数 538
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The Advanced ALD system is a viscous flow-type reactor for ultra thin
film deposition. The growth process is controlled by a Windows-based
software package. The base model is equipped with two gas lines and
handles wafer size up to 12 ". With a compact footprint, all hardware
is enclosed in a negative pressure cabinet for safety more
information.
Applications
— High k dielectrics
— Nanocoatings
— Surface modification layers
— Device encapsulations
— Photonic crystals
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