光刻机,镀膜机,磁控溅射镀膜仪,电子束蒸发镀膜仪,开尔文探针系统(功函数测量),气溶胶设备,气溶胶粒径谱仪,等离子增强气相沉积系统(PECVD),原子层沉积系统(ALD),快速退火炉,气溶胶发生器,稀释器,滤料测试系统
显影机 /湿法刻蚀机
显影机-匀胶机
器简介:
德国品质(配有防污染内衬,标配两个大小吸盘,性能优于美国同类品牌)
显影机 /湿法刻蚀机技术参数:
聚四氟乙烯材质
CHEMICAL DISPENSE | 型号 | 甩干 | 清洗 | 洁净 | 蚀刻 | 手动涂胶 | 自动涂胶 | 显影 | 样品衬底尺寸 |
手动滴胶 | SPIN150i | ![]() | ![]() | ![]() | ![]() | ![]() | UP TO ?160mm (or 6") OR 4”x4” | ||
SPIN150i-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
MCD200-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | UP TO ?260mm (or 8") OR 6”x6” | |||
MCD200-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
自动滴胶 | ACD200-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | ||
ACD200-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | |||
手动滴胶 | MCD300-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | UP TO ?360mm (or 12") OR 8"x8" | ||
MCD300-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
自动滴胶 | ACD300-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | ||
ACD300-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() |
显影机-匀胶机仪器简介:
德国品质(配有防污染内衬,标配两个大小吸盘,性能优于美国同类品牌)
显影机 /湿法刻蚀机技术参数:
聚四氟乙烯材质
CHEMICAL DISPENSE | 型号 | 甩干 | 清洗 | 洁净 | 蚀刻 | 手动涂胶 | 自动涂胶 | 显影 | 样品衬底尺寸 |
手动滴胶 | SPIN150i | ![]() | ![]() | ![]() | ![]() | ![]() | 最大160mm (6"英寸) , 4”x4” | ||
SPIN150i-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
MCD200-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | 最大260mm ( 8"英寸) 6”x6” | |||
MCD200-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
自动滴胶 | ACD200-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | ||
ACD200-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | |||
手动滴胶 | MCD300-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | 最大360mm (12"英寸) 8"x8" | ||
MCD300-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ||||
自动滴胶 | ACD300-PTFE | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() | ||
ACD300-PTFE-IND | ![]() | ![]() | ![]() | ![]() | ![]() | ![]() |